Semiconductor devices, finfet devices and methods of forming the same

ABSTRACT

Semiconductor devices, FinFET devices and methods of forming the same are disclosed. One of the semiconductor devices includes a substrate, a gate over the substrate and a gate dielectric layer between the gate and the substrate. The gate dielectric layer includes an oxide-inhibiting layer having a dielectric constant greater than about 8 and being in an amorphous state.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experiencedexponential growth. Technological advances in IC materials and designhave produced generations of ICs where each generation has smaller andmore complex circuits than the previous generation. In the course of ICevolution, functional density (i.e., the number of interconnecteddevices per chip area) has generally increased while geometry size(i.e., the smallest component (or line) that can be created using afabrication process) has decreased. This scaling down process generallyprovides benefits by increasing production efficiency and loweringassociated costs.

Such scaling down has also increased the complexity of processing andmanufacturing ICs and, for these advances to be realized, similardevelopments in IC processing and manufacturing are needed. For example,a three dimensional transistor, such as a fin-type field-effecttransistor (FinFET), has been introduced to replace a planar transistor.Although existing FinFET devices and methods of forming FinFET deviceshave been generally adequate for their intended purposes, they have notbeen entirely satisfactory in all respects.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the criticaldimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIG. 1A to FIG. 1H are schematic perspective views of a method offorming a FinFET device in accordance with some embodiments.

FIG. 2A to FIG. 2B are schematic perspective views of a method offorming a FinFET device in accordance with alternative embodiments.

FIG. 3 is a flow chart of a method of forming a FinFET device inaccordance with some embodiments.

FIG. 4 is a cross-sectional view of a semiconductor device in accordancewith some embodiments.

FIG. 5 is a cross-sectional view of a semiconductor device in accordancewith alternative embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a second feature over or on a first feature in the description thatfollows may include embodiments in which the second and first featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the second and first features,such that the second and first features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath”, “below”, “lower”,“on”, “over”, “overlying”, “above”, “upper” and the like, may be usedherein for ease of description to describe one element or feature'srelationship to another element(s) or feature(s) as illustrated in thefigures. The spatially relative terms are intended to encompassdifferent orientations of the device in use or operation in addition tothe orientation depicted in the figures. The apparatus may be otherwiseoriented (rotated 90 degrees or at other orientations) and the spatiallyrelative descriptors used herein may likewise be interpretedaccordingly.

FIG. 1A to FIG. 1H are schematic perspective views of a method offorming a FinFET device in accordance with some embodiments.

Referring to FIG. 1A, a substrate 100 with one or more fins 102 isprovided. In some embodiments, the substrate 100 includes a group IVelement or a group III-V semiconductor compound, such as Si, Ge, SiGe,GaAs, InAs, InGaAs, or the like. In some embodiments, the substrate 100includes silicon substrate, a silicon-on-insulator (SOI) substrate, or asubstrate formed of other suitable semiconductor materials. Depending onthe requirements of design, the substrate 100 may be a P-type substrateor an N-type substrate and may have doped regions therein. The dopedregions may be configured for an N-type FinFET device or a P-type FinFETdevice. In some embodiments, the one or more fins 102 extend in a firstdirection.

In some embodiments, the method of forming the substrate 100 with fins102 includes forming a mask layer on a bulk substrate, and removing aportion of the bulk substrate by using the mask layer as an etch mask.In alternative embodiments, the method of forming the substrate 100 withfins 102 includes performing a sidewall image transfer (SIT) technique.In some embodiments, the fins 102 are oxidized to form stop layersrespectively on surfaces of the fins 102, and the stop layers serve asetch stop layers for the subsequent dummy gate removal step.

Still referring to FIG. 1A, the substrate 100 further has an isolationlayer 104 formed thereon. In some embodiments, the isolation layer 104covers lower portions of the fins 102 and exposes upper portions of thefins 102. In some embodiments, the isolation layer 104 is a shallowtrench isolation (STI) structure. The isolation layer 104 includes adielectric material such as silicon oxide. The method of forming theisolation layer 104 includes forming an isolation material layercovering the fins 102, and removing a portion of the isolation materiallayer with chemical mechanical polishing (CMP) and/or etching back.

In some embodiments, the fins 102 are active fins and are formed beforethe formation of the isolation layer. In alternative embodiments, atleast some of the fins 102 are dummy fins and are replaced with activefins after the formation of the isolation layer. Besides, the fins 102include a material the same as or different from that of the substrate100.

Still referring to FIG. 1A, a dummy gate 106 is formed on the substrate100 and across the fins 102. In some embodiments, the dummy gate 106extends in a direction different from (e.g., perpendicular to) theextending direction of the fins 102. The dummy layer 106 includes asilicon-containing material such as polysilicon, amorphous silicon or acombination thereof. In some embodiments, an optional mask layer isformed on the dummy gate 106, and the mask layer includes silicon oxide,silicon nitride, a combination thereof or the like. In some embodiments,the method of forming the dummy layer 106 includes depositing a dummymaterial layer on the substrate 100 covering the fins 102, andpatterning the dummy material layer by photolithography and etchingprocesses.

Thereafter, spacers 110 are formed on sidewalls of the dummy gate 106.In some embodiments, the spacers 110 include a nitrogen-containingdielectric material, a carbon-containing dielectric material or both,and the spacers have a dielectric constant less than about 10, less than9, less than 8, less than about 7, less than about 6 or even less thanabout 5. In some embodiments, the spacers 110 includes SiN, SiCN, SiOCN,SiOR (wherein R is an alkyl group such as CH₃, C₂H₅ or C₃H₇), SiC, SiOC,SiON, a combination thereof or the like. In some embodiments, thespacers 110 are made of a single material. In alternative embodiments,each of the spacers 110 is a multi-layer structure. In some embodiments,the method of forming the spacers 110 includes forming at least onespacer material layer on the isolation layer 104 covering the dummy gate106, and removing a portion of the spacer material layer by at least oneanisotropic etching process.

Referring to FIG. 1B, multiple source/drain regions 112 are formed attwo opposite sides of the dummy gate 106. Specifically, two source/drainregions 112 are formed at both sides of each fin 102. In someembodiments, the exposed upper portions of the fins 102 are removed byusing a suitable technique such as an anisotropic etching process, andtherefore, recesses 108 are formed in the isolation layer 104. In someembodiments, the exposed upper portions of the fins 102 are removed byusing the dummy gate 106 and the spacers 110 as an etch mask. That is,the step of forming the recesses 108 is considered a self-alignedetching step. In some embodiments, an enlarging step and/or a roundingstep can be included after the recess forming step, so the resultingrecess profile can have a diamond-like shape, a bucket-like shape or thelike.

Thereafter, the source/drain regions 112 are formed by selectivelygrowing epitaxy layers from the recesses 108. Specifically, thesource/drain regions 112 are formed within the recesses 108 and extendupwardly along the sidewalls of the corresponding spacers 110. In someembodiments, the source/drain regions 112 include silicon germanium,silicon carbon or silicon phosphate. In some embodiments, thesource/drain regions 112 include silicon germanium (SiGe) for a P-typeFinFET device. In alternative embodiments, the source/drain regions 112include silicon carbon (SiC), silicon phosphate (SiP), SiCP or a SiC/SiPmulti-layer structure for an N-type FinFET device. In some embodiments,the source/drain regions 112 may be optionally implanted with an N-typedopant or a P-type dopant as needed. In some embodiments, the adjacentsource/drain regions 112 at the same side are separate from each other,as shown in FIG. 1B. In alternative embodiments, the adjacentsource/drain regions 112 at the same side are connected. Following theformation of the source/drain regions 112, silicide regions may beformed by siliciding the top portions of the source/drain regions 112.

Referring to FIG. 1C, a dielectric layer 114 is formed aside or aroundthe dummy gate 106. The dielectric layer 114 includes a nitride such assilicon nitride, an oxide such as silicon oxide, phosphosilicate glass(PSG), borosilicate glass (BSG), boron-doped phosphosilicate glass(BPSG), a combination thereof or the like. In some embodiments, thedielectric layer 114 is made of a single material. In alternativeembodiments, the dielectric layer 114 includes a multi-layer structure.The dielectric layer 114 may be filled until its top surface is higherthan the top surface of the dummy gate 106 by a suitable fabricationtechnique such as spin-coating, CVD, flowable CVD, PECVD, ALD, acombination or the like. A planarization step such as CMP is thenperformed to remove the excess dielectric layer. In some embodiments,the dummy gate 106 is used as a polish stop layer, so that the topsurface of the dielectric layer 114 is substantially level with the topsurface of the dummy gate 106. In some embodiments, a contact etch stoplayer (CESL) is formed after the step of forming the source/drainregions 112 and before the step of forming the dielectric layer 114, andthe CESL includes SiN, SiC or the like.

Thereafter, the dummy gate 106 is removed to form a trench 113 in thedielectric layer 114. The removing step includes performing a suitableetching process. In some embodiments, the stop layers (e.g., siliconoxide layers) on the surfaces of the fins 102 are simultaneously removedduring the step of removing the dummy gate 106.

Referring to FIG. 1D, an oxide-inhibiting layer 116 is deposited on thesurface of the trench 113. Specifically, the oxide-inhibiting layer 116is formed on the sidewall and bottom of the trench 113 and on the topand sidewall of each fin 102. In some embodiments, the oxide-inhibitinglayer 116 is in physical contact with the fins 102.

Herein, the term “oxide-inhibiting layer” is referred to as an elementfor inhibiting the growth of an oxide film. Specifically, oxide is notpresent within the oxide-inhibiting layer or on the surface of theoxide-inhibiting layer. In some embodiments, the oxide-inhibiting layeris an oxide-free layer. In some embodiments, the oxide-inhibiting layer116 has a dielectric constant greater than about 8. In some embodiments,the oxide-inhibiting layer 116 includes aluminum nitride (AlN), indiumnitride (InN), gallium nitride (GaN), thallium nitride (TlN), acombination thereof or the like. The combination thereof can be amulti-layer structure including at least two of the above-mentionedmaterials or a mixed composition such as AlGaN, AlGaInN or the like. Insome embodiments, the method of forming the oxide-inhibiting layer 116includes performing a suitable deposition technique, such as chemicalvapor deposition (CVD), plasma-enhanced CVD (PECVD), atomic layerdeposition (ALD), remote plasma ALD (RPALD), plasma-enhanced ALD(PEALD), molecular-beam deposition (MBD) or the like.

It is noted that the oxide-inhibiting layer 116 is formed in aphase-stable amorphous state, so as to prevent leakage currents frompassing along grain boundaries and therefore prevent the underlyingelements from being damaged. Herein, the oxide-inhibiting layer 116 inan amorphous state is referred to as an amorphous oxide-inhibiting layerthrough the description of the disclosure. Besides, the high dielectricconstant value (greater than 8) of the oxide-inhibiting layer 116 isbeneficial to significantly reduce the effective oxide thickness (EOT)of the gate dielectric layer.

It is also noted that the formation of the oxide-inhibiting layerdecreases Dit (indicating the interface trap density or interface statedensity), reduces Jg (indicating leakage current) and lower thecapacitance equivalent thickness (CET), so the reliability of the deviceis therefore improved.

Referring to FIG. 1E, a plasma treatment 118 is performed to theoxide-inhibiting layer 116. In some embodiments, the plasma treatment118 is for passivating and/or cleaning the surface of theoxide-inhibiting layer 116 and fixing the defect vacancies and/ornitrogen vacancies within the oxide-inhibiting layer 116. In someembodiments, the plasma treatment 118 for the oxide-inhibiting layer 116contributes to a further improvement of the CET, Dit and Jg. In someembodiments, the plasma treatment 118 includes using anitrogen-containing gas and a hydrogen-containing gas. In someembodiments, the plasma treatment 118 includes using nitrogen (N₂) andhydrogen (H₂). In alternative embodiments, the plasma treatment 118includes using nitrogen (N₂) and ammonium (NH₃). Herein, theplasma-treated oxide inhibiting layer is indicated as an oxideinhibiting layer 116 a. Upon the plasma treatment 118, the oxideinhibiting layer 116 a remains in the amorphous state.

Referring to FIG. 1F, a high-k layer 120 is deposited on theoxide-inhibiting layer 116 a. Specifically, the high-k layer 120 isconformally formed on the surface of the oxide-inhibiting layer 116 a.In some embodiments, the high-k layer 120 has a dielectric constantgreater than about 10. Specifically, the high-k layer 120 has adielectric constant greater than that of the oxide inhibiting layer116/116 a. In some embodiments, the high-k layer 120 is a single layer.In alternative embodiments, the high-k layer 120 is a multi-layer layer.In some embodiments, the high-k layer 120 includes a lower high-k layerand an upper high-k layer, and the dielectric constant of the lowerhigh-k layer is between the dielectric constant of the oxide inhibitinglayer 116 a and the dielectric constant of the upper high-k layer. Forexample, the dielectric constant of the oxide inhibiting layer 116 a isgreater than about 8, the dielectric constant of the lower high-k layeris greater than about 10, and the dielectric constant of the upperhigh-k layer is greater than about 12.

In some embodiments, the high-k layer 120 includes metal oxide, such asZrO₂, Gd₂O₃, HfO₂, BaTiO₃, Al₂O₃, LaO₂, TiO₂, Ta₂O₅, Y₂O₃, STO, BTO,BaZrO, HfZrO, HfLaO, HfTaO, HfTiO, a combination thereof, or a suitablematerial. In alternative embodiments, the high-k material 120 canoptionally include a silicate such as HfSiO, LaSiO, AlSiO, a combinationthereof, or a suitable material. In some embodiments, the method offorming the high-k layer 120 includes performing at least one suitabledeposition technique, such as CVD, PECVD, metal oxide chemical vapordeposition (MOCVD), ALD, RPALD, PEALD, MBD or the like.

In some embodiments, the high-k layer 120 is formed in a fully amorphousstate. In alternative embodiments, the high-k layer 120 is formed in apartially crystalline state; that is, the high-k layer 120 is formed ina mixed crystalline-amorphous state and having some degree of structuralorder. In yet alternative embodiments, the high-k layer 120 is formed ina fully crystalline state. The dielectric constant of the high-k layer120 can change depending upon whether the material is amorphous orcrystalline. A material in a crystalline state usually has a dielectricconstant greater than that of the same material in an amorphous state.

Referring to FIG. 1G, an optional annealing step 122 is performed to thehigh-k layer 120. In some embodiments, upon the annealing step 122, thehigh-k layer 120 is transformed from an amorphous state to a partiallyor fully crystalline sate. In alternative embodiments, upon theannealing step 122, the high-k layer 120 is transformed from a partiallycrystalline state to a fully crystalline sate.

In some embodiments, the annealing temperature of the annealing step 122ranges from about 300° C. to 1,500° C., such as from about 400° C. to1,000° C. The annealing temperature is varied depending on thetransformation or crystallization temperature of the high-k layer 120,and the temperature ranges are not limited by the above-mentionedvalues. Herein, the annealed high-k layer is indicated as a high-k layer120 a.

It is noted that the oxide-inhibiting layer 116 a is in a phase-stableamorphous state, so the plasma treatment 118 and the annealing step 122do not change the state/phase of the oxide-inhibiting layer 116 a.Thereafter, upon the annealing step 122, the oxide-inhibiting layer 116a remains in an amorphous state, and the high-k layer 120 a above theoxide-inhibiting layer 116 a is transformed into a crystalline state.However, the annealing step 122 can be omitted as needed. In such case,the oxide-inhibiting layer 116 a remains in an amorphous state, and thehigh-k layer 120 above the oxide-inhibiting layer 116 a remains in itsoriginal state such as an amorphous state or a crystalline state. Foreither case, the amorphous oxide-inhibiting layer 116 a serves as ablocking layer to block leakage currents from passing through.

Referring to FIG. 1G, a gate 124 (or called “replacement gate”) isformed in the trench 113. Specifically, the gate 124 filling theremaining trench 113. In some embodiments, the gate 124 includes metal,such as TiN, TaC, TaN, TaSiN, HfN, ZrSi₂, MoSi₂, TaSi₂, NiSi₂, WN or thelike. When the device of the disclosure is an N-type FinFET device, thegate 124 includes an N-type work function metal material. When thedevice of the disclosure is a P-type FinFET device, the gate 124includes a P-type work function metal material. The gate 124 is formedby a suitable deposition technique such as CVD, ALD, PVD, sputtering,plating, a combination thereof or the like. A FinFET device 10 of thedisclosure is thus completed.

In some embodiments, the oxide-inhibiting layer is introduced betweenthe substrate and the high-k layer, so as to suppress the formation ofthe low-k silicate interfacial layer, leading to the reduction in CET.Besides, the oxide-inhibiting layer is formed in a phase-stableamorphous state, so as to prevent leakage currents from passing alonggrain boundaries and therefore prevent the underlying elements frombeing damaged. Therefore, the CET, Dit and Jg are improved, and theperformance of the device is enhanced.

The above-mentioned embodiments in which the oxide-inhibiting layer 116a is in physical contact with the fins 102 is provided for illustrationpurposes, and are not construed as limiting the present disclosure. Insome embodiments, the oxide-inhibiting layer 116 is not in physicalcontact with the fins 102.

FIG. 2A to FIG. 2B are schematic perspective views of a method offorming a FinFET device in accordance with alternative embodiments. Themethod of FIG. 1A to FIG. 1H is similar to the method of FIG. 2A to FIG.2B, and the difference between them lies in that in the latter method,an oxide-based layer is further provided between the oxide-inhibitinglayer 116 a and each of the fins 102.

Referring to FIG. 2A, an intermediate structure of FIG. 1C is provided,and an oxide-based layer 115 is formed at least on the surfaces of thefins 102. In some embodiments, the oxide-based layer 115 is in physicalcontact with the fins 102.

Herein, the term “oxide-based layer” is referred to as anoxygen-containing element. In some embodiments, the oxide-based layer115 has a dielectric constant less than about 8, less than about 6 oreven less than about 4. In some embodiments, the oxide-based layer 115includes silicon oxide, silicon oxynitride, a combination thereof or thelike.

In some embodiments, the oxide-based layer 115 is formed on the sidewalland bottom of the trench 113 and on the top and sidewall of each fin102. In some embodiments, the method of forming the oxide-based layer115 includes performing a suitable depositing technique, such as CVD,PECVD, ALD, RPALD, PEALD, MBD or the like.

In alternative embodiments, the oxide-based layer 115 is formed merelyon the top and sidewall of each fin 102, and such oxide-based layer 115can be formed through thermal oxidation.

In yet alternative embodiments, the oxide-based layer 115 can be thestop layers formed on the surfaces of the fins 102 after the fins 102are provided, and the stop layers are substantially intact during thestep of removing the dummy gate 106.

In some embodiments, the oxide-based layer 115 is in an amorphous state.In alternative embodiments, the oxide-based layer 115 is in acrystalline state. In yet alternative embodiments, the oxide-based layer115 is in a mixed crystalline-amorphous state. The state/phase of theoxide-based layer 115 does not matter as long as the oxide-inhibitinglayer is provided in an amorphous state for blocking leakage currentsfrom passing through.

Still referring to FIG. 2A, an oxide-inhibiting layer 116 is depositedon the oxide-based layer 115. Specifically, the oxide-inhibiting layer116 is conformally formed on the surface of the oxide-based layer 115.Steps similar to those described in FIG. 1D to 1H are then performed. AFinFET device 20 of the disclosure is thus completed, as shown in FIG.2B. Similarly, the oxide-inhibiting layer is introduced between thesubstrate and the high-k layer, so as to improve the CET, Dit and Jg andtherefore enhance the performance of the device.

The above-mentioned process steps can be concisely illustrated withreference to the flow chart of FIG. 3.

At step 302, a substrate 100 is provided with at least one fin 102, adummy gate 106 across the at least one fin 102, and a dielectric layer114 aside the dummy gate 106, as shown in FIG. 1A to FIG. 1B. At step304, the dummy gate 106 is removed to form a trench 113 in thedielectric layer 114, as shown in FIG. 1C and FIG. 2A. At step 306, anoptional oxide-based layer 115 is formed at least on the surface of theat least one fin 102, as shown in FIG. 2A. At step 308, an amorphousoxide-inhibiting layer 116 having a dielectric constant greater thanabout 8 is deposited on the surface of the trench 113, as shown in FIG.1D and FIG. 2A. In some embodiments, the amorphous oxide-inhibitinglayer 116 is formed in contact with the at least one fin 102, as shownin FIG. 1D. In alternative embodiments, the amorphous oxide-inhibitinglayer 116 is formed in contact with the oxide-based layer 115 withoutcontacting the at least one fin 102, as shown in FIG. 2A. At step 310, aplasma treatment 118 is performed to the amorphous oxide-inhibitinglayer 116, so as to form an amorphous oxide-inhibiting layer 116 a, asshown in FIG. 1E. At step 312, a high-k layer 120 having a dielectricconstant greater than about 10 is deposited on the amorphousoxide-inhibiting layer 116 a, as shown in FIG. 1F. At step 314, anannealing step 122 is performed to the high-k layer 120, so as to form ahigh-k layer 120 a, as shown in FIG. 1G. In some embodiments, thestate/phase of the high-k layer 120 a is transformed into a crystallinestate upon the annealing step 122. At step 316, a gate 124 is formed inthe trench 113, as shown in FIG. 1H and FIG. 2B.

The structures of the FinFET devices of the disclosure are describedwith reference to FIG. 1H and FIG. 2B.

In some embodiments, a FinFET device 10/20 includes a substrate 100having at least one fin 102, a gate 124 including a metal-containingmaterial disposed across the at least one fin 102, a gate dielectriclayer between the gate 124 and the at least one fin 102, spacers 110 onthe sidewalls of the gate 124 and source/drain regions 112 at two endsof the at least one fin 102.

In some embodiments, the gate dielectric layer includes anoxide-inhibiting layer 116 a and a high-k layer 120 a, as shown in FIG.1H. In such case, the oxide-inhibiting layer 116 a is in contact withthe at least one fin 102. In some embodiments, the oxide-inhibitinglayer 116 a has a dielectric constant lower than that of the high-klayer 120 a. For example, the oxide-inhibiting layer 116 a has adielectric constant greater than about 8, and the high-k layer 120 a hasa dielectric constant greater than about 10. In some embodiments, theamorphous oxide-inhibiting layer and the crystalline high-k layer have acombined EOT less than about 0.4 nm or less than about 0.3 nm.

In alternative embodiments, the gate dielectric layer includes anoxide-based layer 115, an oxide-inhibiting layer 116 a and a high-klayer 120 a, as shown in FIG. 2B. In such case, the oxide-inhibitinglayer 116 a is not in contact with the at least one fin 102. In someembodiments, the oxide-inhibiting layer 116 a has a dielectric constantlower than that of the high-k layer 120 a while greater than that of theoxide-based layer 115. For example, the oxide-based layer 115 has adielectric constant less than about 8, the inhibiting layer 116 a has adielectric constant greater than about 8, and the high-k layer 120 a hasa dielectric constant greater than about 10.

In some embodiments, the oxide-based layer 115 includes silicon oxide,silicon oxynitride or a combination thereof. In some embodiments, theoxide-inhibiting layer 116 a includes metal nitride in an amorphousstate, such as aluminum nitride, indium nitride, gallium nitride,thallium nitride, a combination thereof or the like. In someembodiments, the high-k layer 120 a includes metal oxide in acrystalline state.

The above-mentioned embodiments in which the method of the disclosure isapplied to a FinFET device process is provided for illustrationpurposes, and are not construed as limiting the present disclosure. Inalternative embodiments, the method of disclosure can be applied to aplanar device process.

FIG. 4 is a cross-sectional view of a semiconductor device in accordancewith some embodiments. FIG. 5 is a cross-sectional view of asemiconductor device in accordance with alternative embodiments.

As shown in FIG. 4 and FIG. 5, a semiconductor device 30/40 includes asubstrate 200 and a gate 224 over the substrate 200, a gate dielectriclayer between the gate 224 and the substrate 200, spacers 210 on thesidewalls of the gate 224 and source/drain regions 212 in the substrate200 beside the gate 224. In some embodiments, the substrate 200 is aplanar substrate. The gate 224 includes a silicon-containing material, ametal-containing material or a combination thereof.

In some embodiments, the gate dielectric layer includes anoxide-inhibiting layer 216 a and a high-k layer 220 a, as shown in FIG.4. In such case, the oxide-inhibiting layer 216 a is in contact with thesubstrate 200. In some embodiments, the oxide-inhibiting layer 216 a hasa dielectric constant lower than that of the high-k layer 220 a. Forexample, the oxide-inhibiting layer 216 a has a dielectric constantgreater than about 8, and the high-k layer 220 a has a dielectricconstant greater than about 10.

In alternative embodiments, the gate dielectric layer includes anoxide-based layer 215, an oxide-inhibiting layer 216 a and a high-klayer 220 a, as shown in FIG. 5. In such case, the oxide-inhibitinglayer 216 a is not in contact with the substrate 200. In someembodiments, the oxide-inhibiting layer 216 a has a dielectric constantlower than that of the high-k layer 220 a while greater than that of theoxide-based layer 215. For example, the oxide-based layer 215 has adielectric constant less than about 8, the inhibiting layer 216 a has adielectric constant greater than about 8, and the high-k layer 220 a hasa dielectric constant greater than about 10.

In view of the above, in some embodiments, an amorphous oxide-inhibitinglayer is introduced between a crystalline high-k layer and a substrateto suppress the formation of the low-k silicate interfacial layer,leading to a reduction in CET. Besides, the Jg is also suppressed by theamorphous oxide-inhibiting layer by three orders of magnitude. Inaddition, the decrease of Dit can be accomplished because of thehydrogen passivation from the plasma treatment to amorphousoxide-inhibiting layer. Moreover, the plasma treatment further reducesthe CET, Dit, and Jg due to deactivation of the nitrogen vacancies. Bythe disposition of the disclosure, the performance and reliability ofthe device are accordingly improved.

In accordance with some embodiments of the present disclosure, asemiconductor device includes a substrate, a gate over the substrate anda gate dielectric layer between the gate and the substrate. The gatedielectric layer includes an oxide-inhibiting layer having a dielectricconstant greater than about 8 and being in an amorphous state.

In accordance with alternative embodiments of the present disclosure, aFinFET device includes a substrate having at least one fin, a gatedisposed across the at least one fin and a gate dielectric layer betweenthe gate and the at least one fin. The gate dielectric layer includes anoxide-inhibiting layer having a dielectric constant greater than about 8and being in an amorphous state, and a high-k layer having a dielectricconstant greater than about 10 and being in a crystalline state.

In accordance with yet alternative embodiments of the present disclosurea method of forming a FinFET device including the following steps. Asubstrate is provided with at least one fin, a dummy gate across the atleast one fin, and a dielectric layer aside the dummy gate. The dummygate is removed to form a trench in the dielectric layer. An amorphousoxide-inhibiting layer having a dielectric constant greater than about 8is deposited on a surface of the trench. A plasma treatment is performedto the amorphous oxide-inhibiting layer. A gate is formed in the trench.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

1. A semiconductor device, comprising: a substrate; a gate over thesubstrate; and a gate dielectric layer between the gate and thesubstrate and comprising an oxide-inhibiting layer having a dielectricconstant greater than about 8 and being in an amorphous state.
 2. Thesemiconductor device of claim 1, wherein the substrate has at least onefin extending in a first direction, and the gate extends in a seconddirection different from the first direction and is across the at leastone fin.
 3. The semiconductor device of claim 1, wherein the substrateis a planar substrate.
 4. The semiconductor device of claim 1, whereinthe oxide-inhibiting layer comprises aluminum nitride, indium nitride,gallium nitride, thallium nitride or a combination thereof.
 5. Thesemiconductor device of claim 1, wherein the gate dielectric layerfurther comprises a high-k layer between the oxide-inhibiting layer andthe gate, and a dielectric constant of the high-k layer is greater thanthe dielectric layer of the oxide-inhibiting layer.
 6. The semiconductordevice of claim 5, wherein the high-k layer is in a crystalline state.7. The semiconductor device of claim 1, wherein the gate dielectriclayer further comprises an oxide-based layer between theoxide-inhibiting layer and the substrate.
 8. The semiconductor device ofclaim 1, wherein the gate comprises a silicon-containing material, ametal-containing material or a combination thereof.
 9. A FinFET device,comprising: a substrate having at least one fin; a gate disposed acrossthe at least one fin; and a gate dielectric layer between the gate andthe at least one fin and comprising: an oxide-inhibiting layer having adielectric constant greater than about 8 and being in an amorphousstate; and a high-k layer having a dielectric constant greater thanabout 10 and being in a crystalline state.
 10. The FinFET device ofclaim 9, wherein the oxide-inhibiting layer is in physical contact withthe at least one fin.
 11. The FinFET device of claim 9, wherein theoxide-inhibiting layer is not in physical contact with the at least onefin.
 12. The FinFET device of claim 9, wherein the oxide-inhibitinglayer comprises aluminum nitride, indium nitride, gallium nitride,thallium nitride or a combination thereof.
 13. The FinFET device ofclaim 9, wherein the oxide-inhibiting layer is an oxide-free layer. 14.The FinFET device of claim 9, wherein the high-k layer comprises a lowerhigh-k layer and an upper high-k layer, and a dielectric constant of thelower high-k layer is between the dielectric constant of theoxide-inhibiting layer and a dielectric constant of the upper high-klayer.
 15. A method of forming a FinFET device, comprising: providing asubstrate with at least one fin, a dummy gate across the at least onefin, and a dielectric layer aside the dummy gate; removing the dummygate to form a trench in the dielectric layer; depositing an amorphousoxide-inhibiting layer having a dielectric constant greater than about 8on a surface of the trench; performing a plasma treatment to theamorphous oxide-inhibiting layer; and forming a gate in the trench,wherein the method further comprises depositing a high-k layer having adielectric constant greater than about 10 on the amorphousoxide-inhibiting layer after the step of performing the plasmatreatment.
 16. The method of claim 15, wherein the amorphousoxide-inhibiting layer comprises aluminum nitride, indium nitride,gallium nitride, thallium nitride or a combination thereof.
 17. Themethod of claim 15, wherein the plasma treatment comprises using anitrogen-containing gas and a hydrogen-containing gas.
 18. (canceled)19. The method of claim 15, further comprising, after the step ofdepositing the high-k layer, performing an annealing step to the high-klayer, so that the high-k layer is transformed into a crystalline sate.20. The method of claim 15, further comprising, before the step offorming the amorphous oxide-inhibiting layer, forming an oxide-basedlayer at least on a surface of the at least one fin.